Caltech On-line SEGS 3-D isotropic/anisotropic etch simulation

What you need:

• A mask-layout in CIF or GDSII format,
• an etchant choice, or known etch rates,
  (preferrably in the .rate file format shown below),
• or xfig (a public domain drawing progam to input mask shapes and display 2d output)

Optional programs:

• ghostview or other Postscript viewer to quickly view the simulation results,
• Any Commercial Solid Modeling Package that can accept IGES files for Rendering and/or Finite Element modeling.