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Robust Mask-Layout and Process Synthesis through an Evolutionary Algorithm

Lin Ma and Erik K. Antonsson

ASME International Mechanical Engineering Congress and Exposition
(November 2000), ASME.

Abstract

A method for automated mask-layout and process synthesis for MEMS is presented. The synthesis problem is approached by use of a genetic algorithm. For a given desired device shape, and several fabrication process choices, this synthesis method will produce one or more mask-layouts and associated fabrica-tion process sequences (which when used can generate shapes close to the desired one). Given complicated device shapes and wide range of fabrication process possibilities, the designer may encounter difficulty producing the right mask-layout and fabrica-tion procedure by experience and trial and error. An automated synthesis tool like this will be helpful to the designer by increas-ing the efficiency and accuracy of the design of MEMS devices.