ASME International Mechanical Engineering Congress and Exposition
(November 2000), ASME.
A method for automated mask-layout and process synthesis
for MEMS is presented. The synthesis problem is approached
by use of a genetic algorithm. For a given desired device shape,
and several fabrication process choices, this synthesis method
will produce one or more mask-layouts and associated fabrica-tion
process sequences (which when used can generate shapes
close to the desired one). Given complicated device shapes and
wide range of fabrication process possibilities, the designer may
encounter difficulty producing the right mask-layout and fabrica-tion
procedure by experience and trial and error. An automated
synthesis tool like this will be helpful to the designer by increas-ing
the efficiency and accuracy of the design of MEMS devices.