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Robust Mask-Layout and Process Synthesis

Lin Ma and Erik K. Antonsson

Submitted for review to Journal of Modeling and Simulation of Microsystems
(August 2000).

Abstract

A method for automated mask-layout and process synthesis for MEMS is presented. The synthesis problem is approached by use of a genetic algorithm. For a given desired device shape, and several fabrication process choices, this synthesis method will produce one or more mask-layouts and associated fabrication process sequences (which when used can generate shapes close to the desired one). Given complicated device shapes and wide range of fabrication process possibilities, the designer may encounter difficulty producing the right mask-layout and fabrication procedure by experience and trial and error. An automated synthesis tool like this will be helpful to the designer by increasing the efficiency and accuracy of the design of MEMS devices.