Submitted for review to Journal of Modeling and Simulation of Microsystems
(August 2000).
Abstract
A method for automated mask-layout and process
synthesis for MEMS is presented. The synthesis problem
is approached by use of a genetic algorithm. For a
given desired device shape, and several fabrication process
choices, this synthesis method will produce one or more
mask-layouts and associated fabrication process sequences
(which when used can generate shapes close to the desired
one). Given complicated device shapes and wide range of
fabrication process possibilities, the designer may encounter
difficulty producing the right mask-layout and fabrication
procedure by experience and trial and error. An automated
synthesis tool like this will be helpful to the designer by increasing
the efficiency and accuracy of the design of MEMS
devices.