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Robust Mask-Layout Synthesis for MEMS

Lin Ma and Erik K. Antonsson

In MSM2001, Modeling and Simulation of Microsystems, Semiconductors, Sensors and Actuators
(Hilton Head Island, SC, U.S.A., Mar. 2001), IEEE.

Abstract

A method for automated mask-layout and process syn-thesis for MEMS using Genetic Algorithms was proposed by Ma and Antonsson [5]. For a given desired device shape, and several fabrication process choices, this synthesis method will produce one or more mask-layouts and associated fabrication process sequences (which when used can generate shapes close to the desired one). This paper extended the previous work by integrating the robustness of the mask-layout rela-tive to the fabrication variations into the evaluation criteria. By introducing expected variations into the fabrication sim-ulation and making the robustness of the mask-layout part of the evaluation criteria, the stochastic optimization procedure will produce mask-layouts that are least sensitive to these variations, and robust design will be synthesized.