In MSM2001, Modeling and Simulation of Microsystems, Semiconductors, Sensors and Actuators
(Hilton Head Island, SC, U.S.A., Mar. 2001), IEEE.
A method for automated mask-layout and process syn-thesis
for MEMS using Genetic Algorithms was proposed by
Ma and Antonsson . For a given desired device shape, and
several fabrication process choices, this synthesis method will
produce one or more mask-layouts and associated fabrication
process sequences (which when used can generate shapes
close to the desired one). This paper extended the previous
work by integrating the robustness of the mask-layout rela-tive
to the fabrication variations into the evaluation criteria.
By introducing expected variations into the fabrication sim-ulation
and making the robustness of the mask-layout part of
the evaluation criteria, the stochastic optimization procedure
will produce mask-layouts that are least sensitive to these
variations, and robust design will be synthesized.