A Framework for Mask-Layout Synthesis Implementing a Level Set Method Simulator

Cin-Young Lee and Erik K. Antonsson

In MSM2001, Modeling and Simulation of Microsystems, Semiconductors, Sensors and Actuators
(Hilton Head Island, SC, U.S.A., Mar. 2001), IEEE.


Recently, evolutionary methods have been developed to automate MEMS mask-layout synthesis [3]--[6]. These design synthesis methods are iterative searches in which each iteration consists of mask-layout modification, determination of etched shape via an arbitrary 3-D etch simulator, and similarity evaluations between the etched shape and the desired shape, which is used to guide modification. The work described here differs from previous work in that a framework is developed for mask-layout synthesis that implements level set methods as the 3-D etch simulator.