In MSM2001, Modeling and Simulation of Microsystems, Semiconductors, Sensors and Actuators
(Hilton Head Island, SC, U.S.A., Mar. 2001), IEEE.
Recently, evolutionary methods have been developed
to automate MEMS mask-layout synthesis --. These
design synthesis methods are iterative searches in which
each iteration consists of mask-layout modification,
determination of etched shape via an arbitrary 3-D etch
simulator, and similarity evaluations between the etched
shape and the desired shape, which is used to guide modification.
The work described here differs from previous
work in that a framework is developed for mask-layout
synthesis that implements level set methods as the 3-D